TakeBooks.com TakeBooks.com TakeBooks.com
TakeBooks.com
TakeBooks.com
  Учебная и научная литература> Технические науки> Радиоэлектроника>

Электроника

TakeBooks.com
TakeBooks.com
 Каталог
:: Java книги
:: Авто
:: Астрология
:: Аудио книги
:: Биографии и Мемуары
:: В мире животных
:: Гуманитарные и общественные науки
:: Детские книги
:: Для взрослых
:: Для детей
:: Дом, дача
:: Журналы
:: Зарубежная литература
:: Знания и навыки
:: Издательские решения
:: Искусство
:: История
:: Компьютеры
:: Кулинария
:: Культура
:: Легкое чтение
:: Медицина и человек
:: Менеджмент
:: Наука и образование
:: Оружие
:: Программирование
:: Психология
:: Психология, мотивация
:: Публицистика и периодические издания
:: Разное
:: Религия
:: Родителям
:: Серьезное чтение
:: Спорт
:: Спорт, здоровье, красота
:: Справочники
:: Техника и конструкции
:: Учебная и научная литература
   :Гуманитарные и общественные науки
   :Естественные науки
   :Технические науки
     :Горное дело
     :Пищевая промышленность
     :Радиоэлектроника
       :Автоматика и телемеханика
       :Квантовая электроника
       :Кибернетика
       :Радиолокация
       :Радиотехника
       :Электрическая связь
       :Электроакустика
       :Электроника
     :Строительство
     :Технологии металлов
     :Транспорт
     :Химическая технология
     :Энергетика
:: Фен-Шуй
:: Философия
:: Хобби, досуг
:: Художественная лит-ра
:: Эзотерика
:: Экономика и финансы
:: Энциклопедии
:: Юриспруденция и право
:: Языки
 Рекомендуем
Новая жизнь без трусов
Новая жизнь без трусов
 Новинки
Katalizmy, ktore zmienialy obraz Ziemi
Katalizmy, ktore zmienialy obraz Ziemi
 
 

Computational Lithography

Computational Lithography
Автор: Arce Gonzalo R.
Издательство: John Wiley & Sons Limited
Cтраниц: 1
Формат: PDF
Размер: 0
ISBN: 9780470618936
Язык: 
Описание:
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.




Просмотров: 7

Пресс - релиз

Последние отзывы:
К настоящему времени нет отзывов!
Написать отзыв
Вход 
Если Вы забыли пароль, щелкните здесь





Вы новый клиент?
Зарегистрируйтесь
 
 Информация 
Свяжитесь с нами
Как скачать и чем читать
  Quiero dinero © 2007